Photoelasticity : Principles and methods
Tipo de material: TextoDetalles de publicación: London : Cleaver-Hume press, 1949.Descripción: 184 pTema(s):
Contenidos:
Stresses;Strain and stress-strain relations;Optics;Polarisation and double refraction;Theory of photoelasticity;Reduction and interpretation of observations;Stresses in three dimensions;The photoeastic bench;Materials and procedure;Examples;Appendix
Biblioteca actual | Signatura topográfica | Estado | Fecha de vencimiento | Código de barras | |
---|---|---|---|---|---|
Koha Ingenieria | 620.171.5 JES- (Navegar estantería(Abre debajo)) | Disponible | C2834 |
Stresses;Strain and stress-strain relations;Optics;Polarisation and double refraction;Theory of photoelasticity;Reduction and interpretation of observations;Stresses in three dimensions;The photoeastic bench;Materials and procedure;Examples;Appendix
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