Designing by photoelasticity
Tipo de material: TextoDetalles de publicación: London : Chapman and Hall, 1952.Descripción: 414 pTema(s):
Contenidos:
Behaviour of light in polariscope;Photoelastic materials;Models: their preparation and testing;Model stresses applied to prototypes;Frozen stress technique for three-dimensional analysis;Stress concentration in particular notches;Stress concentration in screw threads, bolts and nuts;Stress concentration at holes;Improvement of designs;The application of stress concentration factors
Biblioteca actual | Signatura topográfica | Estado | Fecha de vencimiento | Código de barras | |
---|---|---|---|---|---|
Koha Ingenieria | 620.171.5 HEY- (Navegar estantería(Abre debajo)) | Disponible | C3209 |
Behaviour of light in polariscope;Photoelastic materials;Models: their preparation and testing;Model stresses applied to prototypes;Frozen stress technique for three-dimensional analysis;Stress concentration in particular notches;Stress concentration in screw threads, bolts and nuts;Stress concentration at holes;Improvement of designs;The application of stress concentration factors
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